3M™ 5Ns Ultra High Purity Boron

3M™ 5Ns Ultra High Purity Boron was developed to meet the specialized needs of the silicon wafer industry. Our boron has 99.999% purity and is one of the best neutron transparent materials available. It is used in the semiconductor industry during the ion implant process step. Quite simply, boron is a necessary ingredient because it is needed when creating silicon based wafers. By using a method called “doping”, users get the 11B into a silicon wafer. We produce ultra high purity boron products enriched in 11boron. They are produced using a unique proprietary process that yields a high purity metallic product.

A Leading Producer of Enriched Boron
Importantly, this quality product is created and backed by 3M – a leading global commercial processor of enriched boron. We create this product, and others, at one of the largest boron isotope enrichment facilities in the world. Notably, we focus on manufacturing optimized materials with an emphasis on stable boron isotopes. Our proprietary manufacturing processes allows 11B enrichment from natural occurring ratios to levels exceeding 99% isotopic purity. We offer a proven supply chain and have decades of experience supplying material to the industry. Additionally, we provide our customers with consistent product quality and the ability to custom engineer products for your unique applications. Our specialists are experts at solving materials-related problems in the demanding semiconductor industries. Work with our 3M technical experts to determine the best ultra-high purity boron for your needs.

Applications

• Silicon wafer dopant