3M™ Trizact™ Pad Conditioners deliver precision, consistency and reliability to semiconductor chemical mechanical polishing (CMP). Diamond-coated ceramic construction is ideal for manufacturing to micro-scale specifications, as well as exceptionally smooth pad surface finishes without tiny scratches commonly caused by diamond grit abrasives.
Featuring precisely-shaped, three-dimensional abrasive structures, 3M™ Trizact™ CMP pad conditioners are ideal for work where consistency is essential. Ceramic structures are coated with micron-graded diamond. Through microreplication – a core 3M technology applied to advanced node semiconductor manufacturing – these structures are reproduced uniformly across the Trizact™ CMP pad conditioner surface. What's more, you can choose from a wide range of tip shapes, height dispersions and patterns to suit your unique applications. The result: long-lasting, extremely consistent performance, longer CMP pad life, and predictable pad finish and pad wear, time after time.
Abrasive Working Surface | B5-M990 Pattern, B6-1900 Pattern, B75-2990 Pattern |
Applications | Advanced Node (Memory & Logic), Wafer Manufacturing, CMP |
CMP Process | Cu (Barrier), STI Process |
Carrier Diameter (Metric) | 107.95 mm |
Carrier Form | Disc |
Carrier Material | Stainless Steel |
Mineral Type | CVD coated ceramic |
Product Series | B5-M990, B6-1900, B75-2990 |
Product Type | Diamond Pad Conditioner |
Data Sheets
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Data Sheets
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Data Sheets
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